Semiconductor mask writer
Semiconductor mask writer
- Productivity Low cost of ownership
- Sustainability Long lasting - built on field proven modern platform
- Reliability Access to skilled engineer from day 1
The next step in our journey – The SLX series e2
In 2019, Mycronic experienced an increasing demand for mature semiconductor nodes driven by the progress of making everything smarter – from consumer goods to cars and all the way to industrial manufacturing equipment. With industry projections pointing that the majority of all new growth stemming from these fields rather than traditional sources like computers and smartphones. This drives the demand for photomasks of mature design nodes due to the larger variety of designs required combined with price-sensitive volume manufacturing.
The industry prefers to use laser-based mask writers due to lower exposure cost per mask thus 70 ~ 75% of all photomasks are produced using laser technology, declaring laser mask writers as the backbone of the semiconductor industry. However, laser mask writers in operation today are getting old making production slow and costly and consequently, not efficient for the purpose.
Mycronic addressed this challenge with the first SLX series and we are ready for the next step in our journey.
SLX e2 series
With the SLX e2 series, we have pushed even further. With optimization to both hardware and software, our SLX e2 systems can address finer resolution than previously. This expands the addressable market for each of our versions, allowing our systems to respectively address smaller and smaller nodes.
Leveraging the ability to meet required specifications for mature nodes, laser-based systems can be used for a larger part of production instead of e-beam systems, decreasing both production costs and time per mask.
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The SLX e2 series is even more reliable. By collecting and analyzing the log files from the system, user get improved levels of quality control, notifications about preventive and predictive maintenance, as well as help to get more out of SLX systems.
Access to skilled service from day 1
The SLX series shares the Evo control platform also used for other Mycronic mask writers. Thus, our skilled service organization with a strong local presence can support the SLX series from day 1 after system installation, allowing maximum system uptime and optimizing system performance.
Wide range of configuration
The SLX series comes in four different base models allowing a wide range of configuration choices to meet customers’ demands.
- SLX 1 e2, the high-throughput i-line model delivers utmost productivity for lower-end semiconductor nodes.
- SLX 2 e2, a well-balanced workhorse for users aiming for both productivity and higher semiconductor nodes.
- SLX Lite 3 e2, a DUV model optimized for Phase Shift Mask application.
- SLX 3 e2, the most advanced model, addressable up to around 90nm semiconductor nodes.
Specifications
SLX 1 e2 |
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| Passes | 2P | 1P |
| Writing speed* | 40 or 34 mins | 20 or 17 mins |
| CD Uniformity (3σ) | 20 nm | 35 nm |
| Registration (3σ) | 25 nm | 40 nm |
| Mask size | 5”~12” | |
* Estimate exposure time with XT mode for 6” mask with area 150 mm x 150 mm or 133 mm x 133 mm.
SLX 2 e2 |
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| Passes | 3P | 2P | 1P |
| Writing speed* | 97 or 78 mins | 64 or 52 mins | 32 or 26 mins |
| CD Uniformity (3σ) | 11 nm | 14 nm | 17 nm |
| Registration (3σ) | 20 nm | 22 nm | 25 nm |
| Mask size | 5”~9” | ||
* Estimate exposure time with XT mode for 6” mask with area 150 mm x 150 mm or 133 mm x 133 mm.
SLX Lite 3 e2 |
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| Passes | 3P | 2P | 1P |
| Writing speed* | 123 or 102 mins | 82 or 68 mins | 41 or 34 mins |
| CD Uniformity (3σ) | 11 nm | 14 nm | 17 nm |
| Registration (3σ) | 20 nm | 22 nm | 25 nm |
| Mask size | 6” | ||
* Estimate exposure time with XT mode for 6” mask with area 150 mm x 150 mm or 133 mm x 133 mm.
SLX 3 e2 |
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| Passes | 3P | 2P | 1P |
| Writing speed* | 169 or 138 mins | 113 or 92 mins | 56 or 46 mins |
| CD Uniformity (3σ) | 9 nm | 12 nm | 15 nm |
| Registration (3σ) | 17 nm | 22 nm | 25 nm |
| Mask size | 6” | ||
* Estimate exposure time with XT mode for 6” mask with area 150 mm x 150 mm or 133 mm x 133 mm.
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SLX™ series
Mycronic SLX series.
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