MMX series
- Lowest cost per mask Superior measurement speed and low running cost
- Modern work horse Field-proven technology, holistic development approach
- Secure performance Derive mask writer utmost registration performance through precise calibration
Description
Purpose-built for placement metrology for mature semiconductor market
MMX is a system to measure the positions of the written pattern to evaluate that the patterns are properly aligned, thereby ensuring the quality of the
produced semiconductor photomask.
MMX series
The MMX series offers a cost-efficient alternative to the placement metrology market.
The system is built on the field-proven SLX platform and leveraged synergy from more than 20 years of experience in mask metrology system in flat panel display industry. It is based on the state-of-the-art Evo control platform, with fully modern software and electronics architecture.
MMX fulfills performance requirement for mature semiconductor nodes segment. It strikes a balance between precision and productivity that is tailor-made for the target segment. The tool performance is highly consistent and stable over time to ensure smooth and streamlined production.
The system offers productivity gain and long-term cost savings via high throughput and flexible handling options for cost-efficient production. The MMX series offers two throughput modes, HT (High Throughput) mode and HA (High-accuracy) mode, to capture wide range of demand in accuracy performance.
The system can handle semiconductor substrate sizes from 5” to 9” with flexible magazine configuration to meet the various demand for photomask size depending on user’s need and to maximize batch processing capability.
Specifications
MMX |
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| Key specification | HT mode | HA mode (Preliminary) |
| Short term repeatability (3σ) | 5 nm | 3 nm |
| Long term repeatability (3σ) | 7 nm | 4 nm |
| Accuracy | 12 nm | 5 nm |
| MAM time | 6 secs | 12 secs |
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